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Study of Ti(C,N) coatings deposited by magnetron sputtering

Author(s): N.Saoula, A.Z.Ait Djafer

In thiswork, Ti(C,N) coating have been deposited byRF reactivemagnetron sputtering (13.56MHz).We’ve been studied the effect of the nitrogen partial pressure and the substrate bias voltage on the properties of titanium carbonitride coatings prepared by RF reactive magnetron sputtering. The deposited coatings were characterized by atomic force microscopy (AFM) and micro-indentation.

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