Abstract

Preparation of Nanocrystalline Aluminum Oxide Thin Films: A Review

Author(s): Ho SM

Nowadays, binary compound such as aluminium oxide thin films are well known for applications in a wide range of microelectronics devices and optoelectronics. This work demonstrates that it is possible to prepare aluminium oxide thin films by using various deposition methods including chemical deposition method and physical deposition technique. Characterization of thin films is a broad science. Here, the characterization of the films was done with x-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy, Fourier transform infrared absorption and UV-visible spectrophotometer.


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