Microhardness values optimization of chemically deposited Ni-P thin films using Taguchi method

Author(s): Alireza Rahimi, Samira Yousefzadeh, Ahmad Dashtizadeh

Ni-P thin films overmild steelwere prepared by electroless deposition, using sodium hypophosphite as reducing agent.Taguchi orthogonal arraywith five process parameters, vis, concentration of nickel ion resource, concentration of reducing agent and complexant and bath operation conditions, pHand temperature of the bath, was used to determine the optimumbath concentrations and operatingconditions, to obtain higher values ofmicrohardness in electroless nickel - phosphorus plating. It has been observed that pH, reducing agent and nickel ion concentration have significant influenceonmicrohardnesscharacteristic.The response,microhardness of plates,was analyzed based on signal-to- noise ratio, and analysis of variance (ANOVA).The result obtain fromoptimumbath composition and bath operating conditions, is quite close to predicted result.The resulting electrolessNi-P coating contain about 9.14wt.% phosphorous with microhardness value of 587HV(50gr).

Share this