All submissions of the EM system will be redirected to Online Manuscript Submission System. Authors are requested to submit articles directly to Online Manuscript Submission System of respective journal.


Magnetron Sputtering Related Parameters Effect On Microstructure and Optical Properties of NiO Films

Author(s): Mukesh Kumar

Nanocrystalline Nickel oxide (NiO) thin films are one of the very important metal oxides because of its outstanding electrical and optical properties. It has got applications in semiconductor devices, sensors and solar cells. Reactive magnetron sputtering deposition of nickel oxide (NiO) films were done on p-type silicon substrate and glass substrate under Ar+O2 gas environment under different processing conditions. The phase, crystallinity and grain size were analysed by x-ray diffraction in grazing incidence mode (GIXRD). The average grain size varied in the range of 12 nm to 28 nm for NiO films. The microstructural analysis was carried out under a field emission scanning electron microscopy (FESEM) as well as transmission electron microscopy (TEM). Direct band gap of investigated NiO films were measured with the help of absorption data obtained from UV-visible photospectrometer. The direct band gap was found to vary from ≈2.92 eV to ≈ 3.96 eV with change in NiO films deposition conditions.

Share this       
Google Scholar citation report
Citations : 9398

International Journal of Chemical Sciences received 9398 citations as per Google Scholar report

Indexed In

  • Google Scholar
  • Open J Gate
  • China National Knowledge Infrastructure (CNKI)
  • Cosmos IF
  • Geneva Foundation for Medical Education and Research

View More