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Chemical Vapor Deposition Growth of MXenes; Mo2C| Abstract
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Abstract

Chemical Vapor Deposition Growth of MXenes; Mo2C

Author(s): Nihan Kosku Perkg÷z

MXenes have emerged as a novel and attention-grabbing member of two-dimensional (2D) material family thanks to their outstanding stability and metallic features. However, it is very challenging to produce large are and uniform 2D MXenes. Herein, we aim to grow controllable, large-area, high quality 2D Mo2C crystals to be utilized as ideal contacts and electrodes by using chemical vapor deposition method. In this specific work, by changing the flow rates of the carrier gases including H2 and N2, we attempt to increase the substrate coverage and flake sizes of 2D Mo2C crystals. When we use only H2 gas we obtained hexagonal and triangular shaped crystals, although the substrate surface was not fully covered. When we introduced the N2 gas to the system, this increased the coverage, however, it also caused the thickness to increase. Regular shaped flakes could be beneficial to be used as contacts in transistors, however, large coverage is required for supercapacitors. This study could provide an insight to obtain high surface coverage with well-shaped crystals.


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