Atomic force microscope (AFM) is an increasing popular tool for characterizing and manipulating of various surfaces. In this work, nanoÂlithography on different surfaces was studied with Atomic Force Microscope. The scratches on various surfaces were created using contact mode by silicon and diamond tips. These scratches made on the polymethylmethacrylate (PMMA) coated on silicon were compared with scratches created on the polyethylene (PE) substrate. Effects of applied normal force, time of applying pressure and number of scratching cycles on the geometry and depth of scratches were studied. This study shows that there is a critical tip force to remove material from various surfaces.